Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.
This journal is a platform for publishing innovative research and overviews for advancing our understanding of the structure, property, and functionality of complex metallic alloys, including intermetallics, metallic glasses, and high entropy alloys.The journal reports the science and engineering of metallic materials in the following aspects:Theories and experiments which address the relationship between property and structure in all length scales.Physical modeling and numerical simulations which provide a comprehensive understanding of experimental observations.Stimulated methodologies to characterize the structure and chemistry of materials that correlate the properties.Technological applications resulting from the understanding of property-structure relationship in materials.Novel and cutting-edge results warranting rapid communication.The journal also publishes special issues on selected topics and overviews by invitation only.